UCPSS 2008 Selected, peer reviewed papers from the 9th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), held in Bruges, Belg

A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading

A central resource of technology and methods for environments where the control of contamination is critical.

Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals an

A central resource of technology and methods for environments where the control of contamination is critical.