Design, Fabrication, and Characterization of Beam - Supported Aluminum Nitride Thin Film Bulk Acoustic Resonators
Author | : Lori Ann Callaghan |
Publisher | : |
Total Pages | : 340 |
Release | : 2005 |
ISBN-10 | : OCLC:759566084 |
ISBN-13 | : |
Rating | : 4/5 (84 Downloads) |
Book excerpt: Micro-mechanical filters comprised of bulk acoustic resonators are being fabricated and studied as a solution to the demands for low power consumption, high functionality devices in the telecommunication industry. A novel, suspended thin Film Bulk Acoustic wave Resonator (SFBAR) has been fabricated using an aluminum nitride film sputtered directly on a 100 silicon substrate. The suspended membrane design uses thin beams to support, as well as electrically connect, the resonator. The SFBAR has been fabricated by combining both thin film processing and bulk silicon micro machining. The AlN was etched in an Inductively Coupled Plasma (ICP) chlorine etch, using titanium dioxide as the masking material. A silicon Deep Reactive Ion Etch (DRIE) was used to create an open ended air cavity with a novel circular shape. A representative resonator, designated here as sample W9HS8 resonator 10018, was characterized with a Quality Factor values at resonance and anti-resonance of 68 and 151,